5 recherche sur le tag 'thin films'   

An introduction to thin films / Maissel, L.I.

Public ISBD Titre : An introduction to thin films Type de document : texte imprimé Auteurs : Maissel, L.I., Auteur ; Francombe, M. H., Auteur Editeur : New York : Gordon and Breach Année de publication : 1973 Importance : vii, 301 p. ISBN/ISSN/EAN : 978-0-677-02840-8 Langues : Anglais (eng) Catégories : Matériaux Tags : THIN FILMS Index. décimale : B-S Ancien fonds Cote : B-S284 Num_Inv : 513 Localisation : LCC (SdS) An introduction to thin films [texte imprimé] / Maissel, L.I., Auteur ; Francombe, M. H., Auteur . - New York : Gordon and Breach, 1973 . - vii, 301 p. ISBN : 978-0-677-02840-8 Langues : Anglais (eng) Catégories : Matériaux Tags : THIN FILMS Index. décimale : B-S Ancien fonds Cote : B-S284 Num_Inv : 513 Localisation : LCC (SdS)

Exemplaires(1)

Code-barres	Cote	Support	Localisation	Section	Disponibilité
513	B-S284	Texte imprimé	Bibliothèque	Livre	Disponible

Surfaces, interfaces, and thin films for microelectronics / Eugene A. Irene

Public ISBD Titre : Surfaces, interfaces, and thin films for microelectronics Type de document : texte imprimé Auteurs : Eugene A. Irene Editeur : Hoboken : Wiley Année de publication : 2008 Importance : xiii, 515 p. Format : 25 cm ISBN/ISSN/EAN : 978-0-470-22478-6 Langues : Anglais (eng) Tags : SURFACE CHEMISTRY  THIN FILMS  MICROELECTRONICS-Materials Index. décimale : EQ -Equipe- Résumé : "Materials Science is predicated on the understanding of why materials behave in the way that they do. This set, consisting of Surfaces, Interfaces, and Films for Microelectronics and Electronic Materials Science by Eugene Irene introduces the reader to the field of materials science, providing extensive coverage of surfaces, interfaces and film fundamentals for microelectronics, as well as the physics and chemistry of microelectronics processing. Such information is designed to provide a basis for the understanding of existing microelectronic applications as well as to inform the design of new ones. Written by an expert with more than 25 years teaching experience in this field, this readily accessible set is appropriate as a primary text for undergraduate and graduate students and will also serve as a valuable resource to professionals who require self-study." Cote : LCC/L Num_Inv : 2860 Surfaces, interfaces, and thin films for microelectronics [texte imprimé] / Eugene A. Irene . - Hoboken : Wiley, 2008 . - xiii, 515 p. ; 25 cm. ISBN : 978-0-470-22478-6 Langues : Anglais (eng) Tags : SURFACE CHEMISTRY  THIN FILMS  MICROELECTRONICS-Materials Index. décimale : EQ -Equipe- Résumé : "Materials Science is predicated on the understanding of why materials behave in the way that they do. This set, consisting of Surfaces, Interfaces, and Films for Microelectronics and Electronic Materials Science by Eugene Irene introduces the reader to the field of materials science, providing extensive coverage of surfaces, interfaces and film fundamentals for microelectronics, as well as the physics and chemistry of microelectronics processing. Such information is designed to provide a basis for the understanding of existing microelectronic applications as well as to inform the design of new ones. Written by an expert with more than 25 years teaching experience in this field, this readily accessible set is appropriate as a primary text for undergraduate and graduate students and will also serve as a valuable resource to professionals who require self-study." Cote : LCC/L Num_Inv : 2860

Exemplaires(1)

Code-barres	Cote	Support	Localisation	Section	Disponibilité
2860	LCC/L	Texte imprimé	Equipe	Livre	Equipe - Demande préalable Disponible

Chemical vapor deposition : principles and applications / Michael L. Hitchman

Public ISBD Titre : Chemical vapor deposition : principles and applications Type de document : texte imprimé Auteurs : Michael L. Hitchman, Auteur ; Klavs F Jensen, Auteur Editeur : London : Academic Press Année de publication : 1993 Importance : v, 677 p. ISBN/ISSN/EAN : 978-0-12-349670-6 Langues : Anglais (eng) Tags : THIN FILMS Index. décimale : EQ -Equipe- Résumé : "This wide-ranging volume covers recent developments in the theoretical understanding of the chemistry and physics of chemical vapour deposition (CVD). Contributors are drawn from both academia and industry to achieve a balaced coverage of the subject. The volume emphasizes principles and understanding rather than details of specific materials or processes. Specific examples are given to illustrate the principles." Note de contenu : "Chemical vapour deposition-an overview. Fundamentals of chemical vapour deposition. Analysis of chemical vapor deposition processes. Chemical vapor deposition at low pressures. Silicon epitaxy by chemical vapor deposition. Organometallic vapor phase epitaxy of III-V materials. Plasma-assisted chemical and vapor deposition. Photo-Assisted chemical vapor deposition. Electronic and optical characterization of chemical vapor deposition films for device applications. Protective coatings. Index." Cote : LCC/B Num_Inv : 1391 Chemical vapor deposition : principles and applications [texte imprimé] / Michael L. Hitchman, Auteur ; Klavs F Jensen, Auteur . - London : Academic Press, 1993 . - v, 677 p. ISBN : 978-0-12-349670-6 Langues : Anglais (eng) Tags : THIN FILMS Index. décimale : EQ -Equipe- Résumé : "This wide-ranging volume covers recent developments in the theoretical understanding of the chemistry and physics of chemical vapour deposition (CVD). Contributors are drawn from both academia and industry to achieve a balaced coverage of the subject. The volume emphasizes principles and understanding rather than details of specific materials or processes. Specific examples are given to illustrate the principles." Note de contenu : "Chemical vapour deposition-an overview. Fundamentals of chemical vapour deposition. Analysis of chemical vapor deposition processes. Chemical vapor deposition at low pressures. Silicon epitaxy by chemical vapor deposition. Organometallic vapor phase epitaxy of III-V materials. Plasma-assisted chemical and vapor deposition. Photo-Assisted chemical vapor deposition. Electronic and optical characterization of chemical vapor deposition films for device applications. Protective coatings. Index." Cote : LCC/B Num_Inv : 1391

Exemplaires(1)

Code-barres	Cote	Support	Localisation	Section	Disponibilité
1391	LCC/B	Texte imprimé	Equipe	Livre	Equipe - Demande préalable Disponible

The science of crystallization: microscopic interfacial phenomena / William A. Tiller

Public ISBD Titre : The science of crystallization: microscopic interfacial phenomena Type de document : texte imprimé Auteurs : William A. Tiller, Auteur Editeur : Cambridge : Cambridge University Press Année de publication : 1991 Importance : xxx, 391 p. ISBN/ISSN/EAN : 978-0-521-38138-3 Langues : Anglais (eng) Catégories : Technologies, Méthodes, Réactions Tags : CRYSTALLIZATION  CRYSTALLOGRAPHY  THIN FILMS Résumé : "This particular volume deals with the important atomistic-level processes occurring at the interface between a crystal and its nutrient. It also provides the necessary scientific background of both thermodynamics and kinetics needed for the understanding of crystallization for both bulk crystals and thin film formation." Note de contenu : "Preface; Symbols * Introduction and philosophy * Interface energetics and molecular attachment kinetics * Dynamic interface shape effects in bulk crystals * The solute partitioning process * Thin film formation via vapour phase processing * Thermodynamics of bulk phases * Thermodynamics of interfaces * General kinetics and the nucleation process references * Index." Cote : B-B121 (SdS) Num_Inv : 509 The science of crystallization: microscopic interfacial phenomena [texte imprimé] / William A. Tiller, Auteur . - Cambridge : Cambridge University Press, 1991 . - xxx, 391 p. ISBN : 978-0-521-38138-3 Langues : Anglais (eng) Catégories : Technologies, Méthodes, Réactions Tags : CRYSTALLIZATION  CRYSTALLOGRAPHY  THIN FILMS Résumé : "This particular volume deals with the important atomistic-level processes occurring at the interface between a crystal and its nutrient. It also provides the necessary scientific background of both thermodynamics and kinetics needed for the understanding of crystallization for both bulk crystals and thin film formation." Note de contenu : "Preface; Symbols * Introduction and philosophy * Interface energetics and molecular attachment kinetics * Dynamic interface shape effects in bulk crystals * The solute partitioning process * Thin film formation via vapour phase processing * Thermodynamics of bulk phases * Thermodynamics of interfaces * General kinetics and the nucleation process references * Index." Cote : B-B121 (SdS) Num_Inv : 509

Exemplaires(1)

Code-barres	Cote	Support	Localisation	Section	Disponibilité
509	B-B121	Texte imprimé	Bibliothèque	Livre	Disponible

The physics of micro/nano-fabrication / Ivor Brodie

Public ISBD Titre : The physics of micro/nano-fabrication Type de document : texte imprimé Auteurs : Ivor Brodie, Auteur ; Julius J. Muray, Auteur Editeur : New-York : Plenum Press Année de publication : 1992 Collection : Microdevices, ISSN 1058-188X Importance : xix, 650 p. ISBN/ISSN/EAN : 978-0-306-44146-2 Langues : Anglais (eng) Tags : THIN FILMS  MICROELECTRONICS-Materials Index. décimale : EQ -Equipe- Résumé : "The authors provide a comprehensive overview of the tools, technologies, and physical models needed to understand, build, and analyze microdevices. Students, specialists within the field, and researchers in related fields will appreciate their unified presentation and extensive references." Note de contenu : "Microelectronic Devices * Planar Processing * Microanalysis * Microdevices * Particle Beams: Sources, Optics, and Interactions* Electron Sources * Ion Sources* Electron Guns * Components for Electron and Ion Optics * Electron Interactions* Ion Interactions * Photon Sources and Interactions* Photon Interactions* Plasmas: Physics and Chemistry * General Background* Collision Processes* Electron Motion in a Gas Discharge* Collective Phenomena in Plasmas* Radio Frequency Glow Discharges* Plasma Chemistry* Vacuum Physics* Layering Technologies* Epitaxy * Chemical Vapor Deposition (CVD)* Doping by Thermal Diffusion * Doping by Ion Implantation * Evaporation in Ultrahigh Vacuum * Cathodic Sputtering * Organic Layer Formation * Selective Layer Removal Technologies * Thickness and Rate Measurement * Laser-Assisted Processes * Electron-Beam-Assisted Processes * Ion-Beam-Assisted Processes * Nucleation and Growth in Layer Formation * Pattern Generation * Optical Lithography * The Physics of Photoresists * Projection Systems * Holographic Lithography * X-ray Lithography * Synchrotron Radiation for X-ray Lithography * Electron-Beam Lithography * Ion-Beam Lithography * Microcharacterization * Parallel Imaging * Serial (Scanning) Imaging * Limits to Nanofabrication * Limits for MOS Devices * Limits for Pattern Generation * Nanostructures" Cote : LCC/B Num_Inv : 1397 The physics of micro/nano-fabrication [texte imprimé] / Ivor Brodie, Auteur ; Julius J. Muray, Auteur . - New-York : Plenum Press, 1992 . - xix, 650 p.. - (Microdevices, ISSN 1058-188X) . ISBN : 978-0-306-44146-2 Langues : Anglais (eng) Tags : THIN FILMS  MICROELECTRONICS-Materials Index. décimale : EQ -Equipe- Résumé : "The authors provide a comprehensive overview of the tools, technologies, and physical models needed to understand, build, and analyze microdevices. Students, specialists within the field, and researchers in related fields will appreciate their unified presentation and extensive references." Note de contenu : "Microelectronic Devices * Planar Processing * Microanalysis * Microdevices * Particle Beams: Sources, Optics, and Interactions* Electron Sources * Ion Sources* Electron Guns * Components for Electron and Ion Optics * Electron Interactions* Ion Interactions * Photon Sources and Interactions* Photon Interactions* Plasmas: Physics and Chemistry * General Background* Collision Processes* Electron Motion in a Gas Discharge* Collective Phenomena in Plasmas* Radio Frequency Glow Discharges* Plasma Chemistry* Vacuum Physics* Layering Technologies* Epitaxy * Chemical Vapor Deposition (CVD)* Doping by Thermal Diffusion * Doping by Ion Implantation * Evaporation in Ultrahigh Vacuum * Cathodic Sputtering * Organic Layer Formation * Selective Layer Removal Technologies * Thickness and Rate Measurement * Laser-Assisted Processes * Electron-Beam-Assisted Processes * Ion-Beam-Assisted Processes * Nucleation and Growth in Layer Formation * Pattern Generation * Optical Lithography * The Physics of Photoresists * Projection Systems * Holographic Lithography * X-ray Lithography * Synchrotron Radiation for X-ray Lithography * Electron-Beam Lithography * Ion-Beam Lithography * Microcharacterization * Parallel Imaging * Serial (Scanning) Imaging * Limits to Nanofabrication * Limits for MOS Devices * Limits for Pattern Generation * Nanostructures" Cote : LCC/B Num_Inv : 1397

Exemplaires(1)

Code-barres	Cote	Support	Localisation	Section	Disponibilité
1397	LCC/B	Texte imprimé	Equipe	Livre	Equipe - Demande préalable Disponible