Titre :	Chemical vapor deposition : principles and applications
Type de document :	texte imprimé
Auteurs :	Michael L. Hitchman, Auteur ; Klavs F Jensen, Auteur
Editeur :	London : Academic Press
Année de publication :	1993
Importance :	v, 677 p.
ISBN/ISSN/EAN :	978-0-12-349670-6
Langues :	Anglais (eng)
Tags :	THIN FILMS
Index. décimale :	EQ -Equipe-
Résumé :	"This wide-ranging volume covers recent developments in the theoretical understanding of the chemistry and physics of chemical vapour deposition (CVD). Contributors are drawn from both academia and industry to achieve a balaced coverage of the subject. The volume emphasizes principles and understanding rather than details of specific materials or processes. Specific examples are given to illustrate the principles."
Note de contenu :	"Chemical vapour deposition-an overview. Fundamentals of chemical vapour deposition. Analysis of chemical vapor deposition processes. Chemical vapor deposition at low pressures. Silicon epitaxy by chemical vapor deposition. Organometallic vapor phase epitaxy of III-V materials. Plasma-assisted chemical and vapor deposition. Photo-Assisted chemical vapor deposition. Electronic and optical characterization of chemical vapor deposition films for device applications. Protective coatings. Index."
Cote :	LCC/B
Num_Inv :	1391

Chemical vapor deposition : principles and applications [texte imprimé] / Michael L. Hitchman, Auteur ; Klavs F Jensen, Auteur . - London : Academic Press, 1993 . - v, 677 p.
ISBN : 978-0-12-349670-6
Langues : Anglais (eng)

Tags :	THIN FILMS
Index. décimale :	EQ -Equipe-
Résumé :	"This wide-ranging volume covers recent developments in the theoretical understanding of the chemistry and physics of chemical vapour deposition (CVD). Contributors are drawn from both academia and industry to achieve a balaced coverage of the subject. The volume emphasizes principles and understanding rather than details of specific materials or processes. Specific examples are given to illustrate the principles."
Note de contenu :	"Chemical vapour deposition-an overview. Fundamentals of chemical vapour deposition. Analysis of chemical vapor deposition processes. Chemical vapor deposition at low pressures. Silicon epitaxy by chemical vapor deposition. Organometallic vapor phase epitaxy of III-V materials. Plasma-assisted chemical and vapor deposition. Photo-Assisted chemical vapor deposition. Electronic and optical characterization of chemical vapor deposition films for device applications. Protective coatings. Index."
Cote :	LCC/B
Num_Inv :	1391