The physics of micro/nano-fabrication / Ivor Brodie

Public ISBD Titre : The physics of micro/nano-fabrication Type de document : texte imprimé Auteurs : Ivor Brodie, Auteur ; Julius J. Muray, Auteur Editeur : New-York : Plenum Press Année de publication : 1992 Collection : Microdevices, ISSN 1058-188X Importance : xix, 650 p. ISBN/ISSN/EAN : 978-0-306-44146-2 Langues : Anglais (eng) Tags : THIN FILMS  MICROELECTRONICS-Materials Index. décimale : EQ -Equipe- Résumé : "The authors provide a comprehensive overview of the tools, technologies, and physical models needed to understand, build, and analyze microdevices. Students, specialists within the field, and researchers in related fields will appreciate their unified presentation and extensive references." Note de contenu : "Microelectronic Devices * Planar Processing * Microanalysis * Microdevices * Particle Beams: Sources, Optics, and Interactions* Electron Sources * Ion Sources* Electron Guns * Components for Electron and Ion Optics * Electron Interactions* Ion Interactions * Photon Sources and Interactions* Photon Interactions* Plasmas: Physics and Chemistry * General Background* Collision Processes* Electron Motion in a Gas Discharge* Collective Phenomena in Plasmas* Radio Frequency Glow Discharges* Plasma Chemistry* Vacuum Physics* Layering Technologies* Epitaxy * Chemical Vapor Deposition (CVD)* Doping by Thermal Diffusion * Doping by Ion Implantation * Evaporation in Ultrahigh Vacuum * Cathodic Sputtering * Organic Layer Formation * Selective Layer Removal Technologies * Thickness and Rate Measurement * Laser-Assisted Processes * Electron-Beam-Assisted Processes * Ion-Beam-Assisted Processes * Nucleation and Growth in Layer Formation * Pattern Generation * Optical Lithography * The Physics of Photoresists * Projection Systems * Holographic Lithography * X-ray Lithography * Synchrotron Radiation for X-ray Lithography * Electron-Beam Lithography * Ion-Beam Lithography * Microcharacterization * Parallel Imaging * Serial (Scanning) Imaging * Limits to Nanofabrication * Limits for MOS Devices * Limits for Pattern Generation * Nanostructures" Cote : LCC/B Num_Inv : 1397 The physics of micro/nano-fabrication [texte imprimé] / Ivor Brodie, Auteur ; Julius J. Muray, Auteur . - New-York : Plenum Press, 1992 . - xix, 650 p.. - (Microdevices, ISSN 1058-188X) . ISBN : 978-0-306-44146-2 Langues : Anglais (eng) Tags : THIN FILMS  MICROELECTRONICS-Materials Index. décimale : EQ -Equipe- Résumé : "The authors provide a comprehensive overview of the tools, technologies, and physical models needed to understand, build, and analyze microdevices. Students, specialists within the field, and researchers in related fields will appreciate their unified presentation and extensive references." Note de contenu : "Microelectronic Devices * Planar Processing * Microanalysis * Microdevices * Particle Beams: Sources, Optics, and Interactions* Electron Sources * Ion Sources* Electron Guns * Components for Electron and Ion Optics * Electron Interactions* Ion Interactions * Photon Sources and Interactions* Photon Interactions* Plasmas: Physics and Chemistry * General Background* Collision Processes* Electron Motion in a Gas Discharge* Collective Phenomena in Plasmas* Radio Frequency Glow Discharges* Plasma Chemistry* Vacuum Physics* Layering Technologies* Epitaxy * Chemical Vapor Deposition (CVD)* Doping by Thermal Diffusion * Doping by Ion Implantation * Evaporation in Ultrahigh Vacuum * Cathodic Sputtering * Organic Layer Formation * Selective Layer Removal Technologies * Thickness and Rate Measurement * Laser-Assisted Processes * Electron-Beam-Assisted Processes * Ion-Beam-Assisted Processes * Nucleation and Growth in Layer Formation * Pattern Generation * Optical Lithography * The Physics of Photoresists * Projection Systems * Holographic Lithography * X-ray Lithography * Synchrotron Radiation for X-ray Lithography * Electron-Beam Lithography * Ion-Beam Lithography * Microcharacterization * Parallel Imaging * Serial (Scanning) Imaging * Limits to Nanofabrication * Limits for MOS Devices * Limits for Pattern Generation * Nanostructures" Cote : LCC/B Num_Inv : 1397

Exemplaires(1)

Code-barres	Cote	Support	Localisation	Section	Disponibilité
1397	LCC/B	Texte imprimé	Equipe	Livre	Equipe - Demande préalable Disponible

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