LCC - Centre de Ressources Documentaires
Titre : |
The physics of micro/nano-fabrication |
Type de document : |
texte imprimé |
Auteurs : |
Ivor Brodie, Auteur ; Julius J. Muray, Auteur |
Editeur : |
New-York : Plenum Press |
Année de publication : |
1992 |
Collection : |
Microdevices, ISSN 1058-188X |
Importance : |
xix, 650 p. |
ISBN/ISSN/EAN : |
978-0-306-44146-2 |
Langues : |
Anglais (eng) |
Tags : |
THIN FILMS MICROELECTRONICS-Materials |
Index. décimale : |
EQ -Equipe- |
Résumé : |
"The authors provide a comprehensive overview of the tools, technologies, and physical models needed to understand, build, and analyze microdevices. Students, specialists within the field, and researchers in related fields will appreciate their unified presentation and extensive references." |
Note de contenu : |
"Microelectronic Devices * Planar Processing * Microanalysis * Microdevices * Particle Beams: Sources, Optics, and Interactions* Electron Sources * Ion Sources* Electron Guns * Components for Electron and Ion Optics * Electron Interactions* Ion Interactions * Photon Sources and Interactions* Photon Interactions* Plasmas: Physics and Chemistry * General Background* Collision Processes* Electron Motion in a Gas Discharge* Collective Phenomena in Plasmas* Radio Frequency Glow Discharges* Plasma Chemistry* Vacuum Physics* Layering Technologies* Epitaxy * Chemical Vapor Deposition (CVD)* Doping by Thermal Diffusion * Doping by Ion Implantation * Evaporation in Ultrahigh Vacuum * Cathodic Sputtering * Organic Layer Formation * Selective Layer Removal Technologies * Thickness and Rate Measurement * Laser-Assisted Processes * Electron-Beam-Assisted Processes * Ion-Beam-Assisted Processes * Nucleation and Growth in Layer Formation * Pattern Generation * Optical Lithography * The Physics of Photoresists * Projection Systems * Holographic Lithography * X-ray Lithography * Synchrotron Radiation for X-ray Lithography * Electron-Beam Lithography * Ion-Beam Lithography * Microcharacterization * Parallel Imaging * Serial (Scanning) Imaging * Limits to Nanofabrication * Limits for MOS Devices * Limits for Pattern Generation * Nanostructures" |
Cote : |
LCC/B |
Num_Inv : |
1397 |
The physics of micro/nano-fabrication [texte imprimé] / Ivor Brodie, Auteur ; Julius J. Muray, Auteur . - New-York : Plenum Press, 1992 . - xix, 650 p.. - ( Microdevices, ISSN 1058-188X) . ISBN : 978-0-306-44146-2 Langues : Anglais ( eng)
Tags : |
THIN FILMS MICROELECTRONICS-Materials |
Index. décimale : |
EQ -Equipe- |
Résumé : |
"The authors provide a comprehensive overview of the tools, technologies, and physical models needed to understand, build, and analyze microdevices. Students, specialists within the field, and researchers in related fields will appreciate their unified presentation and extensive references." |
Note de contenu : |
"Microelectronic Devices * Planar Processing * Microanalysis * Microdevices * Particle Beams: Sources, Optics, and Interactions* Electron Sources * Ion Sources* Electron Guns * Components for Electron and Ion Optics * Electron Interactions* Ion Interactions * Photon Sources and Interactions* Photon Interactions* Plasmas: Physics and Chemistry * General Background* Collision Processes* Electron Motion in a Gas Discharge* Collective Phenomena in Plasmas* Radio Frequency Glow Discharges* Plasma Chemistry* Vacuum Physics* Layering Technologies* Epitaxy * Chemical Vapor Deposition (CVD)* Doping by Thermal Diffusion * Doping by Ion Implantation * Evaporation in Ultrahigh Vacuum * Cathodic Sputtering * Organic Layer Formation * Selective Layer Removal Technologies * Thickness and Rate Measurement * Laser-Assisted Processes * Electron-Beam-Assisted Processes * Ion-Beam-Assisted Processes * Nucleation and Growth in Layer Formation * Pattern Generation * Optical Lithography * The Physics of Photoresists * Projection Systems * Holographic Lithography * X-ray Lithography * Synchrotron Radiation for X-ray Lithography * Electron-Beam Lithography * Ion-Beam Lithography * Microcharacterization * Parallel Imaging * Serial (Scanning) Imaging * Limits to Nanofabrication * Limits for MOS Devices * Limits for Pattern Generation * Nanostructures" |
Cote : |
LCC/B |
Num_Inv : |
1397 |
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1397
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LCC/B |
Texte imprimé |
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